Advanced Ge pre-amorphization salicide technology for sub-quarter-micrometer SOI CMOS devices

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1997, Pages 95-96

  Hsiao, Tommy C ^a   Liu, Ping ^a   Woo, Jason C S ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; ELECTRIC RESISTANCE MEASUREMENT; LEAKAGE CURRENTS; MORPHOLOGY; SEGREGATION (METALLOGRAPHY); SEMICONDUCTING FILMS; SEMICONDUCTING GERMANIUM; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING; SILICON ON INSULATOR TECHNOLOGY; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS;

SILICIDES;

CMOS INTEGRATED CIRCUITS;

EID: 0030647287     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/vlsit.1997.623712     Document Type: Conference Paper

References (4)