Rigorous statistical process variation analysis for quarter-μm CMOS with advanced TCAD metrology

International Workshop on Statistical Metrology, Proceedings, IWSM

Volumn , Issue , 1997, Pages 8-11

  Aoyama, Kimiko ^a   Kunitomo, Hisaaki ^a   Tsuneno, Katsumi ^a   Sato, Hisako ^a   Mori, Kazutaka ^a   Masuda, Hiroo ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; CMOS INTEGRATED CIRCUITS; COMPUTER AIDED DESIGN; FABRICATION; MEASUREMENTS; SENSITIVITY ANALYSIS;

RESPONSE SURFACE FUNCTION; STATISTICAL PROCESS VARIATION ANALYSIS; TCAD METROLOGY;

STATISTICAL PROCESS CONTROL;

EID: 0030647083     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)