Low damage reactive ion etching process for fabrication of ridge waveguide lasers

Conference Proceedings - International Conference on Indium Phosphide and Related Materials

Volumn , Issue , 1997, Pages 578-581

  Qiu, B C ^a   Ooi, B S ^a   Bryce, A C ^a   Hicks, S E ^a   Wilkinson, C D W ^a   De La Rue, R M ^a   Marsh, J H ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DRY ETCHING; OPTICAL WAVEGUIDES; PHOTOLUMINESCENCE; POINT DEFECTS; REACTIVE ION ETCHING; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR PLASMAS; THERMAL EFFECTS;

DRY ETCHED LASERS; PLASMA POWER; RIDGE WAVEGUIDE LASERS;

QUANTUM WELL LASERS;

EID: 0030645861     PISSN: 10928669     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)