Role of SiH2 in 1H NMR of μc-Si:H deposited with different plasma excitation frequencies and silane concentrations

Materials Research Society Symposium - Proceedings

Volumn 452, Issue , 1997, Pages 791-796

  Hari, P ^a   Taylor, P C ^a   Finger, F ^a  

^a UNIVERSITY OF UTAH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; HYDROGEN; MOLECULES; NUCLEAR MAGNETIC RESONANCE; SILANES;

MICROCRYSTALLINE SILICON; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA EXCITATION FREQUENCY;

SEMICONDUCTING SILICON;

EID: 0030645473     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)