Plasma induced charging evaluation using SCA and PDM tools

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1997, Pages 143-148

  Karzhavin, Yuri ^a   Lao, Keith ^a   Wu, Wei ^a   Gelatos, Carol ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GATES (TRANSISTOR); MICROWAVE DEVICES; MOSFET DEVICES; OXIDES; PHOTORESISTS; SEMICONDUCTOR DEVICE STRUCTURES; SILICON WAFERS;

INDUCTIVELY COUPLED PLASMA (ICP); PLASMA DAMAGE MONITOR (PDM); SEMATECH PROCESS INDUCED DAMAGE EFFECT REVEALER (SPIDER); SURFACE CHARGE ANALYZER (SCA);

PLASMA ETCHING;

EID: 0030644710     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)