Plasma charging damage on ultra-thin gate oxides

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1997, Pages 15-18

  Park, Donggun ^a   Hu, Chenming ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CHARGE; ELECTRIC CONTACTS; ELECTRON TUNNELING; PLASMA ETCHING;

CONTACT ETCHING PROCESS; PLASMA CHARGING DAMAGE; ULTRATHIN GATE OXIDES;

MOSFET DEVICES;

EID: 0030644614     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)