Effect of surfactant concentration on dispersion stability as probed by the film thickness stability mechanism

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 118, Issue 3, 1996, Pages 221-243

  Nikolov, Alex D ^a   Wasan, Darsh T ^a   Friberg, Stig E ^b  

^a Illinois Institute of Technology   (United States)

^b CLARKSON UNIVERSITY   (United States)

Author keywords

dispersion stability; film thickness; stability mechanism; surfactant concentration

Indexed keywords

CRYSTAL MICROSTRUCTURE; MICELLES; MICROSTRUCTURE; PHASE INTERFACES; SURFACE ACTIVE AGENTS; SURFACE TENSION; THIN FILMS;

CRYSTAL-LIKE STRUCTURE; DISPERSION STABILITY; FILM STABILIZATION; FILM THICKNESS; INVERSE MICELLAR SOLUTION; STABILITY MECHANISM; SURFACTANT CONCENTRATION;

DISPERSIONS;

DODECYL SULFATE SODIUM; SURFACTANT; TETRADECYL SULFATE SODIUM;

CONFERENCE PAPER; MICELLE; PRIORITY JOURNAL;

EID: 0030592739     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/0927-7757(96)03687-4     Document Type: Conference Paper

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