Upd mechanisms of copper and thallium on a Pt(111) electrode studied by in-situ IRAS and EC-STM

Journal of Electroanalytical Chemistry

Volumn 409, Issue 1-2, 1996, Pages 95-101

  Oda, Ichiro ^a   Shingaya, Yoshitaka ^a   Matsumoto, Hiroki ^a   Ito, Masatoki ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

Copper; Platinum; Thallium; Underpotential deposition

Indexed keywords

COPPER; ELECTROCHEMICAL ELECTRODES; ELECTRODEPOSITION; ELECTROLYTES; INFRARED SPECTROSCOPY; IONS; PLATINUM; SCANNING TUNNELING MICROSCOPY; SULFURIC ACID; THALLIUM;

ANION STRETCHING FREQUENCY; BISULFATE ANIONS; ELECTROCHEMICAL SCANNING TUNNELING MICROSCOPY; TIME RESOLVED IN SITU INFRARED SPECTROSCOPY; UNDERPOTENTIAL DEPOSITION;

INTERFACES (MATERIALS);

EID: 0030573501     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-0728(95)04490-6     Document Type: Article

References (17)

1. D.M. Kolb, Z. Phys. Chem. N.F., 154 (1987) 179.
2. H. Ogasawara, J. Inukai and M. Ito, Surf. Sci., 311 (1994) L665.
3. H. Matsumoto, I. Oda, J. Inukai and M. Ito, J. Electroanal. Chem., 356 (1993) 275.
4. S. Manne, P.K. Hansma, J. Massie, V.B. Elings and A.A. Gewirth, Sci., 251 (1991) 133.
5. M.F. Toney, J.G. Gordon, M.G. Samant, G.L. Borges, O.R. Melroy, D. Yee and L.B. Sorensen, J. Phys. Chem., 99 (1995) 4733.
6. Y. Shingaya and M. Ito, J. Electroanal. Chem., 372 (1994) 283.
7. Y. Shingaya, H. Matsumoto, H. Ogasawara and M. Ito, Surf. Sci., 335 (1995) 23.
8. H. Matsumoto, J. Inukai and M. Ito, J. Electroanal. Chem., 379 (1994) 223.
9. D.R. Wheeler, J.X. Wang and R.R. Adzic, J. Electroanal. Chem., 387 (1995) 115.
10. O.M. Magnussen, J. Hageböck, J. Hotlos and R.J. Behm, Faraday Discuss., 94 (1992) 329.
11. A.M. Funtikov, U. Linke, U. Stimming and R. Vogel, Surf. Sci., 324 (1995) L343.
12. O.M. Magnussen, J. Hotlos, R.J. Nichols, D.M. Kolb and R.J. Behm, Phys. Rev. Lett., 64 (1990) 2929. T. Hachiya, H. Honbo and K. Itaya, J. Electroanal. Chem., 315 (1991) 275.
13. O.M. Magnussen, J. Hotlos, R.J. Nichols, D.M. Kolb and R.J. Behm, Phys. Rev. Lett., 64 (1990) 2929. T. Hachiya, H. Honbo and K. Itaya, J. Electroanal. Chem., 315 (1991) 275.
14. J.X. Wang, R.R. Adzic and B.M. Ocko, J. Phys. Chem., 98 (1994) 7182.
15. T. Abe, L.J. Wan and K. Itaya, Proc. 61st Denkikagaku Symp., Sendai, Japan, 1994, p. 293.
16. W. Polewska, J.X. Wang, B.M. Ocko and R.R. Adzic, J. Electroanal. Chem., 376 (1994) 41.
17. G.J. Edens, X. Gao and M.J. Weaver, J. Electroanal. Chem., 375 (1994) 357.