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Volumn 32, Issue 12, 1996, Pages 1143-1144
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Kink modification using body contact bias in InP based InAIAs/InGaAs HEMTs
a a a
a
NTT CORPORATION
(Japan)
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Author keywords
Gallium indium arsenide; High electron mobility transistors
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Indexed keywords
CURRENT VOLTAGE CHARACTERISTICS;
ELECTRIC CURRENTS;
ELECTRODES;
MOLECULAR BEAM EPITAXY;
REACTIVE ION ETCHING;
SEMICONDUCTING GALLIUM COMPOUNDS;
SEMICONDUCTING INDIUM COMPOUNDS;
SEMICONDUCTING INDIUM PHOSPHIDE;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR DEVICE STRUCTURES;
SUBSTRATES;
DRAIN CURRENT;
DRAIN TO SOURCE VOLTAGE;
GATE BIAS;
PARASITIC CURRENT;
WET CHEMICAL ETCHING;
HIGH ELECTRON MOBILITY TRANSISTORS;
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EID: 0030572227
PISSN: 00135194
EISSN: None
Source Type: Journal
DOI: 10.1049/el:19960726 Document Type: Article |
Times cited : (6)
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References (8)
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