Porous silicon via freeze drying

Materials Letters

Volumn 26, Issue 6, 1996, Pages 295-298

  Amato, G ^a   Brunetto, N ^a,b  

^a ISTITUTO ELETTROTECNICO NAZIONALE GALILEO FERRARIS   (Italy)

^b UNIVERSITY OF TURIN   (Italy)

Author keywords

Contamination; Freeze drying; Morphology; Photoluminescence; Porous silicon; Stress

Indexed keywords

CONTAMINATION; CRYSTALLINE MATERIALS; DRYING; FREEZING; MORPHOLOGY; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; SILICON WAFERS; STRESSES; SUBLIMATION; SURFACE TENSION;

ANODISATION; FREEZE DRYING;

POROUS SILICON;

EID: 0030571898     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-577X(95)00244-8     Document Type: Article

References (10)

1. H. Mimura, T. Matsumoto, T. Futagi and Y. Kanemitsu, J. Phys. Soc. Jpn. 63 Suppl. B (1994) 203.
2. M.G. Berger, M. Thönissen, R. Arens-Fischer, H. Münder, H. Lüth, M. Amtzen, W Theiβ, Thin Sol. Films 255 (1995) 313.
3. P. Steiner and W. Lang, Thin Sol. Films 255 (1995) 52.
4. L.T. Canham, Appl. Phys. Lett. 57 (1990) 1046.
5. U. Grüning and A. Yelon, Thin Sol. Films 255 (1995) 135.
6. L.T. Canham, A.G. Cullis, C. Pickering, O.D. Dosser, T. I. Cox and T.P. Lynch, Nature 398 (1994) 133.
7. St. Frohnhoff, R. Arens-Fischer, T. Heinrich, J. Fricke, M. Amtzen, W. Theiβ, Thin Sol. Films 255 (1995) 115.
8. O. Belmont, C. Faivre, D. Bellet and Y. Bréchet, Thin Sol. Films, to be published.
9. G. Amato, N. Brunetto, V. Bullara and L. Boarino, Thin Sol. Films, to be published.
10. I.H. Campbell and P.M. Fauchet, Solid State Commun. 58 (1984) 739.