SCOPUS 정보 검색 플랫폼

Volumn 69, Issue 23, 1996, Pages 3471-3473

Near field scanning optical microscopy measurements of optical intensity distributions in semiconductor channel waveguides

(5) Poweleit, C D a,c Naghski, David H b Lindsay, Susan M a Boyd, Joseph T b Jackson, Howard E a

a UNIVERSITY OF CINCINNATI (United States)

b University of Cincinnati (United States)

c ARIZONA STATE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTROMAGNETIC FIELDS; FINITE DIFFERENCE METHOD; LIGHT TRANSMISSION; MATHEMATICAL MODELS; NUMERICAL METHODS; OPTICAL MICROSCOPY; REFRACTIVE INDEX; SEMICONDUCTING ALUMINUM COMPOUNDS; SURFACES;

ALUMINUM GALLIUM ARSENIDE; BEAM PROPAGATION MODE; CHANNEL WAVEGUIDES; EFFECTIVE INDEX METHOD; NEAR FIELD SCANNING OPTICAL MICROSCOPY; OPTICAL INTENSITY DISTRIBUTION;

WAVEGUIDES;

EID: 0030566490 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.117255 Document Type: Article

Times cited : (18)

References (11)

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