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Volumn 169, Issue 2, 1996, Pages 287-292

Electro/electroless deposition and characterization of Cu-In precursors for CIS (CuInSe2) films

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODEPOSITION; ELECTROLESS PLATING; FILM GROWTH; MICROANALYSIS; SCANNING ELECTRON MICROSCOPY; SINTERING; STOICHIOMETRY; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

EID: 0030566278     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(96)00397-1     Document Type: Article
Times cited : (12)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.