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Volumn 169, Issue 2, 1996, Pages 287-292
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Electro/electroless deposition and characterization of Cu-In precursors for CIS (CuInSe2) films
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRODEPOSITION;
ELECTROLESS PLATING;
FILM GROWTH;
MICROANALYSIS;
SCANNING ELECTRON MICROSCOPY;
SINTERING;
STOICHIOMETRY;
THERMAL EFFECTS;
THIN FILMS;
X RAY DIFFRACTION ANALYSIS;
COPPER INDIUM PRECURSORS;
ELECTRON PROBE MICROANALYSIS (EPMA);
SELENIZATION;
COPPER COMPOUNDS;
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EID: 0030566278
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(96)00397-1 Document Type: Article |
Times cited : (12)
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References (17)
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