Fabrication of ultrathin silicon dioxide layers in ultra high vacuum

Applied Surface Science

Volumn 107, Issue , 1996, Pages 172-177

  Majamaa, T ^a   Airaksinen, V M ^a   Sinkkonen, J ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; OXIDATION; PLASMA APPLICATIONS; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; THERMAL EFFECTS; ULTRATHIN FILMS; VACUUM APPLICATIONS;

MOLECULAR FLUXES; ULTRAHIGH VACUUM CHAMBER;

SILICA;

EID: 0030566275     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00477-1     Document Type: Article

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