Fabrication of quantum well photonic integrated circuits using laser processing

Applied Surface Science

Volumn 106, Issue , 1996, Pages 326-334

  Marsh, J H ^a   Bryce, A C ^a   De La Rue, R M ^a   McLean, C J ^a   McKee, A ^a   Lullo, G ^a,b  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

^b UNIVERSITY OF PALERMO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

INTERDIFFUSION (SOLIDS); LIGHT ABSORPTION; LIGHT MODULATORS; NEODYMIUM LASERS; OPTICAL COMMUNICATION EQUIPMENT; OPTICAL PROPERTIES; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR QUANTUM WELLS; THERMAL EFFECTS;

PHOTO ABSORPTION INDUCED DISORDERING (PAID); PHOTONIC INTEGRATED CIRCUITS; QUANTUM WELL INTERMIXING TECHNIQUE; RIDGE WAVEGUIDE LASERS;

INTEGRATED OPTOELECTRONICS;

EID: 0030565873     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00414-X     Document Type: Article

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