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Volumn 106, Issue , 1996, Pages 179-185
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ArF excimer laser epitaxy of Si x Ge 1-x alloys studied by XRD and XPS
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
EPITAXIAL GROWTH;
EXCIMER LASERS;
MATHEMATICAL MODELS;
SEMICONDUCTING GERMANIUM;
SILICON ALLOYS;
SUBSTRATES;
SURFACES;
THIN FILMS;
X RAY DIFFRACTION ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
EXCIMER LASER INDUCED EPITAXY;
LASER CHEMICAL VAPOR DEPOSITION;
PULSE IRRADIATION;
PULSED LASER APPLICATIONS;
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EID: 0030565721
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(96)00430-8 Document Type: Article |
Times cited : (11)
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References (19)
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