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Volumn 106, Issue , 1996, Pages 179-185

ArF excimer laser epitaxy of Si x Ge 1-x alloys studied by XRD and XPS

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; EPITAXIAL GROWTH; EXCIMER LASERS; MATHEMATICAL MODELS; SEMICONDUCTING GERMANIUM; SILICON ALLOYS; SUBSTRATES; SURFACES; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0030565721     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00430-8     Document Type: Article
Times cited : (11)

References (19)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.