Measurement of the stopping powers for channeled ions in ion implanted single crystals

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 118, Issue 1-4, 1996, Pages 43-46

  Kotai E ^a  

^a WIGNER RESEARCH CENTRE FOR PHYSICS   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL IMPURITIES; HYDROGEN; ION IMPLANTATION; IONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON; SINGLE CRYSTALS; TARGETS;

BEAM MISALIGNMENT; ION BEAM CHANNELING METHOD; RESONANCE BACKSCATTERING; STOPPING POWERS;

PARTICLE BEAM DYNAMICS;

EID: 0030565051     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(95)01191-9     Document Type: Article

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