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Applied Surface Science

Volumn 102, Issue , 1996, Pages 404-407

Atomic force microscopy study on the surface structure of oxidized porous silicon

(7) Young, T F a Huang, I W a Yang, Y L a Kuo, W C a Jiang, I M a Chang, T C b Chang, C Y b

a NATIONAL SUN YAT SEN UNIVERSITY (Taiwan)

b NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC BREAKDOWN OF SOLIDS; ELECTRIC CONDUCTIVITY OF SOLIDS; FRACTALS; NITRIC ACID; OXIDATION; SILVER; SURFACE STRUCTURE; THIN FILMS;

HILLOCK CLUSTERS; NONLINEAR DIRECT CURRENT RESPONSE; SELF AFFINE FRACTAL STRUCTURE;

POROUS SILICON;

EID: 0030564911 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/0169-4332(96)00087-6 Document Type: Article

Times cited : (12)

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