P-channel SiGe heterostructures for field effect applications

Applied Surface Science

Volumn 102, Issue , 1996, Pages 221-229

  Whall, T E ^a  

^a UNIVERSITY OF WARWICK   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; CYCLOTRON RESONANCE; ELECTRONIC PROPERTIES; HALL EFFECT; INTERFACES (MATERIALS); MAGNETORESISTANCE; MOSFET DEVICES; SEMICONDUCTING SILICON COMPOUNDS; SURFACE ROUGHNESS; VOLTAGE MEASUREMENT;

ALLOY DISORDER; INTERFACE CHARGE; PHONON SCATTERING; STRAIN INDUCED MODIFICATIONS; TWO DIMENSIONAL HOLE GAS;

HETEROJUNCTIONS;

EID: 0030564815     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)00053-0     Document Type: Article

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