Photolysis of glyoxal at 193, 248, 308 and 351 nm

Chemical Physics Letters

Volumn 257, Issue 5-6, 1996, Pages 487-491

  Zhu, Lei ^a,b   Kellis, Daniel ^a   Ding, Chuan Fan ^a  

^a WADSWORTH CENTER   (United States)

^b STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030564768     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/0009-2614(96)00570-2     Document Type: Article

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