XPS analysis of chemically etched II-VI semiconductor surfaces

Applied Surface Science

Volumn 100-101, Issue , 1996, Pages 652-655

  Kita, A ^a   Ozawa, M ^a   Gutleben, C D ^a  

^a SONY CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BINDING ENERGY; CLEANING; EPITAXIAL GROWTH; ETCHING; HYDROCHLORIC ACID; MOLECULAR BEAM EPITAXY; SEMICONDUCTING FILMS; SEMICONDUCTING ZINC COMPOUNDS; SURFACE TREATMENT;

SEMICONDUCTOR SURFACES; SODIUM HYDROXIDE;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0030564482     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)00357-1     Document Type: Article

References (3)

1. R.B. Shalvoy, G.B. Fisher and P.J. Stiles, Phys. Rev. B 15 (1977) 1680.
2. S.W. Gaarentstroom and N. Winograd, J. Chem. Phys. 67 (1977) 3500.
3. R. Hoogewijs, L. Fiermans and J. Vennik, J. Electron Spectrosc. Rel. Phen. 11 (1977) 171.