Depth-dependent non-destructive analysis of thin overlayers using total-reflection-angle X-ray spectroscopy

Applied Surface Science

Volumn 100-101, Issue , 1996, Pages 69-72

  Shibata, Noriyoshi ^a   Okubo, Soichiro ^a   Yonemitsu, Kyoko ^a  

^a JAPAN FINE CERAMICS CENTER   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; ELECTRON BEAMS; GOLD; MATHEMATICAL MODELS; NONDESTRUCTIVE EXAMINATION; PALLADIUM; SILICON; STRUCTURE (COMPOSITION); THIN FILMS; X RAYS;

DEPTH DEPENDENT NON DESTRUCTIVE ANALYSIS; EMISSION ANGLE; FILM THICKNESS; FLUORESCENT X RAY INTENSITY; THIN OVERLAYERS;

X RAY SPECTROSCOPY;

EID: 0030564441     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)00259-0     Document Type: Article

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