STM analysis of wet-chemically prepared H-Si(001) surface

Applied Surface Science

Volumn 100-101, Issue , 1996, Pages 440-443

  Morita, Yukinori ^a   Tokumoto, Hiroshi ^a  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; HYDROFLUORIC ACID; PH; ROUGHNESS MEASUREMENT; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SURFACE STRUCTURE; SURFACE TREATMENT; WETTING;

ROOT MEAN SQUARE; SURFACE MICROROUGHNESS; ULTRAHIGH VACUUM;

SURFACE ROUGHNESS;

EID: 0030564432     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)00316-9     Document Type: Article

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