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Volumn 100-101, Issue , 1996, Pages 51-55

Auger electron spectroscopy measurement of electron attenuation lengths using multilayer systems

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC; ATTENUATION; ELECTRONS; IONS; MULTILAYERS; RHODIUM; SEMICONDUCTING INDIUM COMPOUNDS; SILICA; SPUTTERING; SURFACES; THICKNESS MEASUREMENT; THIN FILMS;

EID: 0030564397     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)00255-3     Document Type: Article
Times cited : (2)

References (18)
  • 13
    • 30244546241 scopus 로고    scopus 로고
    • Mikro-i™, KOBE STEEL Ltd., 2-3-2 Toyo, Koto, Tokyo 135, Japan
    • Mikro-i™, KOBE STEEL Ltd., 2-3-2 Toyo, Koto, Tokyo 135, Japan.
  • 14
    • 30244552784 scopus 로고    scopus 로고
    • Scanning Auger Nanoprobe 670xi, Physical Electronics Inc., Minnesota, USA
    • Scanning Auger Nanoprobe 670xi, Physical Electronics Inc., Minnesota, USA.
  • 18
    • 30244454081 scopus 로고    scopus 로고
    • private communication
    • S. Tanuma, private communication.
    • Tanuma, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.