Roughness study of ion-irradiated silica glass surface

Applied Surface Science

Volumn 100-101, Issue , 1996, Pages 374-377

  Oyoshi, Keiji ^a   Hishita, Shunichi ^a   Wada, Kenji ^a   Suehara, Shigeru ^a   Aizawa, Takashi ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPACTION; FUSED SILICA; ION BEAMS; ION BOMBARDMENT; MODIFICATION; MORPHOLOGY; RELAXATION PROCESSES; SPUTTERING; VISCOSITY;

MORPHOLOGICAL CHANGES; STRUCTURAL CHANGES; VISCOUS RELAXATION;

SURFACE ROUGHNESS;

EID: 0030564308     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)00245-0     Document Type: Article

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