Microsegregation far from equilibrium

Journal of Crystal Growth

Volumn 163, Issue 4, 1996, Pages 461-469

  Jackson, Kenneth A ^a   Gilmer, George H ^b   Temkin, Dmitri E ^c   Beatty, Kirk M ^a  

^a University of Arizona   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c BARDIN CENTRAL RESEARCH INSTITUTE OF FERROUS METALLURGY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH; COMPUTER SIMULATION; DIFFUSION IN SOLIDS; ION IMPLANTATION; MATHEMATICAL MODELS; MIXTURES; MONTE CARLO METHODS; SEMICONDUCTING SILICON; THERMODYNAMIC PROPERTIES;

DIFFUSION COEFFICIENT; DISTRIBUTION COEFFICIENT; GROWTH CONDITION; ISING MODEL; MICROSEGREGATION; RAPID CRYSTALLIZATION RATE;

CRYSTALLIZATION;

EID: 0030564085     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-0248(95)00971-X     Document Type: Article

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