Synthesis, reactivity, and properties of new diaryliodonium salts as photoinitiators for the cationic polymerization of epoxy silicones

Journal of Applied Polymer Science

Volumn 60, Issue 5, 1996, Pages 705-713

  Castellanos, F ^a   Fouassier, J P ^a   Priou, C ^b   Cavezzan, J ^b  

^a Ecole Nationale Superieure de Chimie de Mulhouse   (France)

^b SANOFI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CATIONIC POLYMERIZATION; EPOXY RESINS; IONS; PHOTOCHEMICAL REACTIONS; SILICONES; SOLUBILITY; SYNTHESIS (CHEMICAL);

DIARYLIODONIUM TETRAKIS BORATE SALTS; PHOTOCHEMICAL PROPERTIES; PHOTOINITIATION;

SALTS;

EID: 0030563921     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1097-4628(19960502)60:5<705::AID-APP7>3.0.CO;2-U     Document Type: Article

References (18)

1. H. J. Timpe, in Radiation Curing in Polymer Science and Technology, Vol. II Photoinitiating Systems, J. P. Fouassier and J. F. Rabek, Eds., Chapman & Hall, London, 1993, pp. 539-544.
2. a) Radiation Curing in Polymer Science and Technology, Vol. IV, Practical Aspects and Applications, J. P. Fouassier and J. F. Rabek, Eds., Chapman & Hall, London, 1993;
3. b) UV-Curing: Science and Technology, S. P. Pappas, Ed., Technology Marketing Corporation, Stamford, 1978, 1985; Plenum Press, New York, 1992;
4. c) UV and EB Curing Formulation for Printing Inks, Coatings and Paints, R. Holman and P. Oldring, Eds., SITA, London, 1988;
5. d) J. P. Fouassier, Photoinitiation, Photopolymerization, Photocuring, Hanser, Münich, 1995.
6. N. P. Hacker, in Radiation Curing in Polymer Science and Technology, Vol. II Photoinitiating Systems, J. P. Fouassier and J. F. Rabek, Eds., Chapman & Hall, London, 1993, pp. 473-504.
7. J. V. Crivello, in Radiation Curing in Polymer Science and Technology, Vol. II, Photoinitiating Systems, J. P. Fouassier and J. F. Rabek, Chapman & Hall, London, 1993, pp. 435-471.
8. P. Borthoul, R. Dolique, L. Domang, and P. Pascal, in Nouveau Traité de Chimie Minérale, Vol. XI, Arsenic, Antimoine, Bismuth, Masson, Paris, 1958, pp. 560-561.
9. a) F. Castellanos, Doctoral dissertation, Mulhouse, 1993;
10. b) C. Priou, A. Soldat, J. Cavezzan, F. Castellanos, and, J. P. Fouassier, J. Coat. Techn., 67, 71-78 (1995).
11. C. Decker, in Radiation Curing: Science and Technology, S. P. Pappas, Ed., Plenum Press, New York, 1992.
12. G. L. Gaines, J. Anal. Chem., 48, 45 (1976).
13. W. A. Mazeika and H. M. Neuman, Inorg. Chem., 5, 309 (1966).
14. D. R. McKean, U. Schaedeli, and S. A. MacDonald, in Polymers in Microlithography, Materials and Processes, A.C.S. Symposium Series 412, American Chemical Society, Washington, DC, 1989, pp. 26-38.
15. J. L. Dektar and N. P. Hacker, J. Am. Chem. Soc., 112, 6004-6015 (1990).
16. J. L. Dektar and N. P. Hacker, Polym. Mater. Sci. Eng., 60, 22-25, (1989).
17. a) C. Priou, J. Cavezzan, F. Castellanos, and J. P. Fouassier, Radtech Conference, Orlando, May 1994;
18. b) F. Castellanos, J. P. Fouassier, C. Priou, J. Cavezzan, Eur. Pat. 562,897 (1993).