High-pressure effects in Si-As-Te amorphous chalcogenide glasses fabricated under microgravity environment

Journal of Non-Crystalline Solids

Volumn 198-200, Issue PART 2, 1996, Pages 705-708

  Shams Kolahi, Wahid ^a   Endo, Shoichi ^a   Kobayashi, Yuki ^a   Honda, A ^a   Nakaike, S ^a   Toma, T ^a   Hambach, M ^a   Takeshima, S ^a   Okamoto, Hiroaki ^a   Hamakawa, Yoshihiro ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPACTION; ELECTRON TRANSITIONS; ELECTRONIC STRUCTURE; FABRICATION; HIGH PRESSURE EFFECTS; MICROGRAVITY PROCESSING; SEMICONDUCTING SILICON COMPOUNDS;

CHALCOGENIDES; INTERATOMIC DISTANCES;

SEMICONDUCTING GLASS;

EID: 0030563558     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-3093(96)00012-9     Document Type: Article

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