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Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 112, Issue 1-4, 1996, Pages 94-98

Preparation of C60 single crystalline thin film by ionized cluster beam deposition and ion implantation into single crystalline C60 thin film

(4) Isoda, Satoru a Kawakubo, Hiroaki a Nishikawa, Satoshi a Wada, Osamu a

a MITSUBISHI ELECTRIC CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; CRYSTAL GROWTH; CRYSTALLINE MATERIALS; DEPOSITION; ELECTRON DIFFRACTION; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION IMPLANTATION; RAMAN SPECTROSCOPY; SINGLE CRYSTALS; THIN FILMS;

CRYSTALLINE ISLANDS; IONIZED CLUSTER BEAM DEPOSITION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SINGLE CRYSTALLINE THIN FILMS; TRANSMISSION ELECTRON DIFFRACTION;

ION BEAM LITHOGRAPHY;

EID: 0030563526 PISSN: 0168583X EISSN: None Source Type: Journal
DOI: 10.1016/0168-583X(95)01233-8 Document Type: Article

Times cited : (9)

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