Chemical and physical effects in oxygen incorporation during the metalorganic vapor phase epitaxial growth of GaAs

Journal of Crystal Growth

Volumn 163, Issue 1-2, 1996, Pages 171-179

  Kuech, T F ^a   Nayak, S ^a   Huang, J W ^a   Li, J ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ATOMS; CRYSTAL LATTICES; FILM GROWTH; MODELS; MORPHOLOGY; OXYGEN; SEMICONDUCTING GALLIUM ARSENIDE; SURFACE ROUGHNESS; SURFACE STRUCTURE;

CHEMICAL EFFECTS; HILLOCK STRUCTURE; OXYGEN INCORPORATION; PHYSICAL EFFECTS; PRECURSOR;

METALLORGANIC VAPOR PHASE EPITAXY;

EID: 0030563397     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-0248(95)01056-4     Document Type: Article

References (19)

1. R.H. Wallis, M.-A. di Forte Poisson, M. Bonnet, G. Beuchet and J.-P. Duchemin, Inst. Phys. Conf. Ser. 56 (1981) 73.
2. J. Schneider, B. Dischler, H. Seelewind, P.M. Mooney, J. Lagowski, M. Matsui, D.R. Beard and R.C. Newman, Appl. Phys. Lett. 54 (1989) 1442.
3. M. Skowronski, S.T. Neild and R.E. Kremer, Appl. Phys. Lett. 57 (1990) 902.
4. D.W. Kisker, J.N. Miller and G.B. Stringfellow, Appl. Phys. Lett. 40 (1982) 614.
5. M.S. Goorsky, T.F. Kuech, F. Cardone, P.M. Mooney, G.J. Scilla and R.M. Potemski, Appl. Phys. Lett. 58 (1991) 1979.
6. J.W. Huang, D.F. Gaines, T.F. Kuench, R.M. Potemski and F. Cardone, J. Electron. Mater. 23 (1994) 659.
7. S. Nayak, J.M. Redwing, T.F. Kuech, Y.-H. Phang, D.E. Savage and M.G. Lagally, Mater. Res. Soc. Symp. 312 (1993) 137.
8. J.M. Redwing, S. Nayak, D.E. Savage, M.G. Lagally, D.F. Dawson-Elli and T.F. Kuech, J. Crystal Growth 145 (1994) 792.
9. S. Nayak, J.W. Huang, J.M. Redwing, D.E. Savage, M.G. Lagally and T.F. Kuech, unpublished.
10. T.F. Kuech, D.W. Kisker, R. Potemski, F. Cardone and G. Scilla, J. Electron. Mater. 21 (1992) 341.
11. J.W. Huang and T.F. Kuech, Appl. Phys. Lett. 65 (1994) 604.
12. T.F. Kuech, J.M. Redwing, J.W. Huang and S. Nayak, Mater. Res. Soc. Symp. Proc. 334 (1994) 189.
13. M. Kasu and N. Kobayashi, Appl. Phys. Lett. 62 (1993) 1262.
14. K. Hata, A. Kawazu, T. Okano, T. Ueda and M. Akiyama, Appl. Phys. Lett. 63 (1993) 1625.
15. I. Ishizaki, S. Goto, M. Kishiyada, T. Fukui and H. Hasegawa, Jpn. J. Appl. Phys. 33 (1994) 721.
16. C.C. Hsu, J.B. Xu and I.H. Wilson, Appl. Phys. Lett. 64 (1994) 2105.
17. H.N. Yang, G.C. Wang and T.M. Lu, Diffraction from Rough Surfaces and Dynamic Growth Front (World Scientific, Singapore, 1993).
18. S.K. Sinha, E.B. Sirota and S. Garoff, Phys. Rev. B Condens. Mat. 38 (1988) 2297.
19. T.F. Kuech, Mater. Sci. Rep. 2 (1987) 1.