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Journal of Non-Crystalline Solids

Volumn 198-200, Issue PART 2, 1996, Pages 919-922

Ge nanocrystals with a sharp size distribution: A detailed study of the crystallization of a-Si1-xOxGey alloy films

(4) Zacharias, M a Blasing J a Christen, J a Wendt, U a

a OTTO VON GUERICKE UNIVERSITY (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; ANNEALING; CRYSTAL GROWTH; CRYSTALLIZATION; GERMANIUM; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; PARTICLE SIZE ANALYSIS; RECRYSTALLIZATION (METALLURGY); SILICON ALLOYS; THIN FILMS;

CLUSTER SIZE; DIMERES; GERMANIUM NANOCRYSTALS; SHARP SIZE DISTRIBUTION; THIN AMORPHOUS SILICON OXIDE GERMANIUM ALLOY FILMS; TRIMERES;

AMORPHOUS FILMS;

EID: 0030563389 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/0022-3093(96)00084-1 Document Type: Article

Times cited : (11)

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