SCOPUS 정보 검색 플랫폼

Volumn 198-200, Issue PART 1, 1996, Pages 132-135

Preparation of new a-SiO2 by glow discharge decomposition of TICS and its application to photoluminescence absorption spectroscopy

(5) Ohsaki, T a Takada, N a Iwama, K a Nitta, S a Nonomura, S a

a GIFU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL ANALYSIS; DECOMPOSITION; ELECTRON SPECTROSCOPY; ENERGY GAP; GLOW DISCHARGES; INTERFACES (MATERIALS); LIGHT ABSORPTION; OPTICAL MULTILAYERS; PHOTOLUMINESCENCE; SILANES; SILICA;

AMORPHOUS SILICA; METAL CLADDING CORE CLADDING MULTILAYER; PHOTOLUMINESCENCE ABSORPTION SPECTROSCOPY; TETRAETHOXY SILANE; TETRAISOCYANATE SILANE;

AMORPHOUS FILMS;

EID: 0030563380 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/0022-3093(95)00670-2 Document Type: Article

Times cited : (4)

References (11)

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2
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4
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7
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.