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Volumn 112, Issue 1-4, 1996, Pages 169-172
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Kinetics of impurity gettering on buried defects created by MeV argon implantation
a a b c a
c
CEMES CNRS
(France)
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHIZATION;
ANNEALING;
ARGON;
CRYSTAL DEFECTS;
GOLD;
MATHEMATICAL MODELS;
PLATINUM;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SEMICONDUCTING SILICON;
THERMAL EFFECTS;
TRANSMISSION ELECTRON MICROSCOPY;
IMPLANTATION DOSE;
IMPLANTATION TEMPERATURE;
METALLIC CONTAMINATION CONCENTRATION;
ION IMPLANTATION;
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EID: 0030563370
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/0168-583X(95)01014-9 Document Type: Article |
Times cited : (14)
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References (13)
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