Effect of ion bombardment during deposition of amorphous silicon and silicon-germanium alloy solar cells

Journal of Non-Crystalline Solids

Volumn 198-200, Issue PART 2, 1996, Pages 1113-1116

  Xu, Xixiang ^a   Yang, Jeffrey ^a   Guha, Subhendu ^a  

^a United Solar Systems Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; ION BOMBARDMENT; PERFORMANCE; SEMICONDUCTING SILICON COMPOUNDS;

DIODE AND TRIODE CONFIGURATIONS; ELECTRIC BIAS EFFECT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

SILICON SOLAR CELLS;

EID: 0030563276     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-3093(96)00057-9     Document Type: Article

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