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Volumn 198-200, Issue PART 2, 1996, Pages 1026-1028
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Selective deposition of amorphous germanium on Si with respect to SiO2 by organometallic CVD
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS MATERIALS;
GERMANIUM ALLOYS;
INFRARED SPECTROSCOPY;
LOW TEMPERATURE OPERATIONS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
SCANNING ELECTRON MICROSCOPY;
SILICA;
X RAY DIFFRACTION ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
SELECTIVE DEPOSITION;
STRUCTURED WAFER;
SILICON WAFERS;
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EID: 0030563275
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/0022-3093(96)00027-0 Document Type: Article |
Times cited : (3)
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References (6)
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