Processing and characterization of ferroelectric thin films by multi-ion-beam sputtering

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 112, Issue 1-4, 1996, Pages 125-128

  Kanno, I ^a   Hayashi, S ^a   Takayama, R ^a   Sakakima, H ^a   Hirao, T ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; EXCIMER LASERS; FILM GROWTH; HYSTERESIS; ION BEAMS; LASER BEAM EFFECTS; PERMITTIVITY; RADIATION EFFECTS; SPUTTERING; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

FERROELECTRIC THIN FILMS; MULTI ION BEAM SPUTTERING;

FERROELECTRIC MATERIALS;

EID: 0030563242     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(95)01003-3     Document Type: Article

References (5)

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