Single shot excimer laser annealing of amorphous silicon for AMLCD

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 376-383

  Boher, Pierre ^a   Stehle, Jean Louis ^a   Stehle, Marc ^a   Godard, Bruno ^a  

^a SOPRA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; ELLIPSOMETRY; EXCIMER LASERS; HYDROGEN; LASER APPLICATIONS; LIQUID CRYSTAL DISPLAYS; OPTIMIZATION; SURFACE ROUGHNESS; THIN FILM TRANSISTORS;

ACTIVE MATRIX LIQUID CRYSTAL DISPLAYS; CRYSTAL SIZE; CRYSTALLINITY; HOMOGENEITY; POLYSILICON FILMS; SINGLE SHOT EXCIMER LASER ANNEALING; SPECTROSCOPIC ELLIPSOMETRY;

ANNEALING;

EID: 0030563126     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00489-0     Document Type: Article

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