SCOPUS 정보 검색 플랫폼

Volumn 96-98, Issue , 1996, Pages 50-54

Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: Application to silicon and germanium

(3) Antoni, F a Fuchs, C a Fogarassy, E a

a Faculté de Médecine (France)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; DEPOSITION; EXCIMER LASERS; HYDRODYNAMICS; LASER PRODUCED PLASMAS; LIGHT EMISSION; LIGHT VELOCITY; NUMERICAL ANALYSIS; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; THIN FILMS; VACUUM;

ANISOTROPIC EXPANSION VELOCITIES; FILM THICKNESS DISTRIBUTION; HYDRODYNAMIC EQUATIONS; LASER ABLATION EMISSION; LASER FLUENCE; LASER GENERATED SPECIES; MONOATOMIC TARGET; PULSED EXCIMER LASER ABLATION;

LASER ABLATION;

EID: 0030563125 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/0169-4332(95)00464-5 Document Type: Article

Times cited : (21)

References (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.