Carbon nitride thin films obtained by laser ablation of graphite in a nitrogen plasma

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 870-873

  Polo, M C ^a   Aguiar, R ^a   Serra, P ^a   Cleries L ^a   Varela, M ^a   Esteve, J ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CHARACTERIZATION; CHEMICAL BONDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAPHITE; NITRIDES; NITROGEN; PLASMA APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICON; THIN FILMS;

ABLATION PLUME; CARBON NITRIDE THIN FILMS; NITROGEN PLASMA; WAVELENGTH DISPERSIVE ELECTRON PROBE; X RAY MICROANALYSIS;

LASER ABLATION;

EID: 0030563103     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00554-4     Document Type: Article

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