Off-axis excimer laser deposition of Ta 2 O 5 thin films

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 656-658

  Inoue, Narumi ^a   Kashiwabara, Shigeru ^a   Toshima, Shigetada ^a   Fujimoto, Ryozo ^b  

^a NATIONAL DEFENSE ACADEMY   (Japan)

^b NIPPON BUNRI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; EXCIMER LASERS; LASER APPLICATIONS; LASER BEAMS; LASER PULSES; PERMITTIVITY; PRESSURE EFFECTS; SILICA; SINTERING; SUBSTRATES; TANTALUM COMPOUNDS;

DEPOSITION PRESSURE; DROP DENSITY; DROPLETS; FILM THICKNESS; LASER FLUENCE; LASER PULSE RATE; OFF AXIS EXCIMER LASER DEPOSITION; SUBSTRATE POSITION;

THIN FILMS;

EID: 0030563101     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00538-2     Document Type: Article

References (5)

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3. K. Kinoshita et al., Jpn. J. Appl. Phys. 33 (1994) L417.
4. M. Iwabuchi et al., Jpn. J. Appl. Phys. 33 (1994) L610.
5. C. Hashimoto et al., IEEE Trans. Electron Devices 36 (1989) 14.