Deposition of fluoropolymer thin films containing semiconductor microcrystallites by VUV laser ablation

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 621-624

  Fujii, T ^a   Inoue, S ^a   Kannari, F ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; DEPOSITION; EMISSION SPECTROSCOPY; EXCIMER LASERS; FLUORINE CONTAINING POLYMERS; LASER ABLATION; MORPHOLOGY; POLYTETRAFLUOROETHYLENES; SEMICONDUCTING CADMIUM COMPOUNDS; SEMICONDUCTOR DOPING; SILICON WAFERS; SURFACES;

ABSORPTION EDGE SHIFT; CRYSTALLINE THIN FILMS; FLUOROPOLYMER THIN FILMS; QUANTUM SIZE EFFECT; SEMICONDUCTOR MICROCRYSTALLITES; THIRD ORDER OPTICAL NONLINEARITY; X RAY PHOTOEMISSION SPECTRA;

THIN FILMS;

EID: 0030563099     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00556-0     Document Type: Article

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