Picosecond UV-laser ablation of Au and Ni films

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 439-442

  Rosenfeld, A ^a   Campbell, E E B ^a  

^a MAX BORN INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; DEPOSITION; FUSED SILICA; GOLD; LASER APPLICATIONS; LASER PULSES; MELTING; METALLIC FILMS; NICKEL;

FILM THICKNESS; GOLD FILMS; NICKEL FILMS; PICOSECOND UV LASER ABLATION; SINGLE SHOT ABLATION THRESHOLDS;

LASER ABLATION;

EID: 0030563073     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00447-5     Document Type: Article

References (6)

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3. W. Kautek and J. Krüger, Proc. SPIE 2207 (1994) 600.
4. E. Matthias, M. Reichling, J. Siegel, O.W. Käding, S. Petzoldt, H. Skurk, P. Bitzenberger and E. Neske, Appl. Phys. A 58 (1994) 129.
5. S. Preuss, E. Matthias and M. Stuke, Appl. Phys. A 59 (1994) 79.
6. See e.g. R.F. Haglund and R. Kelly, in: Fundamental Processes in Sputtering of Atoms and Molecules (SPUT92), Mat.-Fys. Medd. 43 (1993) 527.