Ion-assisted pulsed-laser deposition for the fabrication of Y-Ba-Cu-O multilayer structures using oriented intermediate layers of YSZ and CeO 2

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 726-730

  Reade, R P ^a   Russo, R E ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); CRYSTAL ORIENTATION; DEPOSITION; DIELECTRIC MATERIALS; FABRICATION; HIGH TEMPERATURE SUPERCONDUCTORS; LASER ABLATION; LASER PULSES; MULTILAYERS; YTTRIUM COMPOUNDS;

ION ASSISTED DEPOSITION; MULTI CHIP MODULES; PULSED LASER DEPOSITION;

THIN FILMS;

EID: 0030563068     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00575-7     Document Type: Article

References (10)

1. F.A. Smidt, Int. Mater. Rev. 35 (1990) 61.
2. O. Auciello and R. Kelly, Ion Bombardment Modification of Surfaces (Elsevier, New York, 1984).
3. M. Marinov, Thin Solid Films 46 (1977) 267.
4. D. Dobrev, Thin Solid Films 92 (1982) 41.
5. L.S. Yu, J.M.E. Harper, J.J. Cuomo and D.A. Smith, Appl. Phys. Lett. 47 (1985) 932.
6. G.K. Hubler, Guest Ed., Pulsed Laser Deposition, in: MRS Bull. 17 (1992).
7. R.P. Reade, S.R. Church and R.E. Russo, Rev. Sci. Instr. 66 (1995).
8. R.P. Reade, P. Berdahl, R.E. Russo and S.M. Garrison, Appl. Phys. Lett. 61 (1992) 2231.
9. S.M. Garrison, N. Newman, B.F. Cole, K. Char and R.W. Barton, Appl. Phys. Lett. 58 (1991) 2168.
10. R.P. Reade, X.L. Mao and R.E. Russo, Appl. Phys. Lett. 59 (1991) 739.