Preferential vaporization and plasma shielding during nano-second laser ablation

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 126-130

  Mao, Xianglei ^a   Chan, Wing Tat ^b   Caetano, Manuel ^c   Shannon, Mark A ^d   Russo, Richard E ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF HONG KONG   (Hong Kong)

^c UNIVERSIDAD CENTRAL DE VENEZUELA   (Venezuela)

^d UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; BRASS; COPPER; EMISSION SPECTROSCOPY; INTERFACES (MATERIALS); LASER BEAM EFFECTS; MODELS; PLASMA APPLICATIONS; THERMAL EFFECTS; VAPORIZATION; ZINC;

INDUCTIVELY COUPLED PLASMA ATOMIC EMISSION SPECTROMETRY; INVERSE BREMSSTRAHLUNG PROCESSES; LASER POWER DENSITY; MASS ABLATION RATE; MIXED MATERIAL TARGETS; NANOSECOND LASER ABLATION; PLASMA SHIELDING; PREFERENTIAL VAPORATION;

LASER ABLATION;

EID: 0030563059     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00420-3     Document Type: Article

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