Epitaxial growth and lattice match of cobalt and nickel disilicides/Si(111) gold and cobalt doping of NiSi2

Physica B: Condensed Matter

Volumn 221, Issue 1-4, 1996, Pages 90-95

  Gay, J M ^a   Mangelinck, D ^b   Stocker, P ^a   Pichaud, B ^b   Gas, P ^b  

^a CAMPUS DE LUMINY   (France)

^b AIX MARSEILLE UNIVERSITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT ALLOYS; DISLOCATIONS (CRYSTALS); DOPING (ADDITIVES); EPITAXIAL GROWTH; INTERFACES (MATERIALS); LATTICE CONSTANTS; NICKEL ALLOYS; SEMICONDUCTING SILICON; THERMAL EXPANSION; THICK FILMS; X RAY DIFFRACTION ANALYSIS;

COBALT DISILICIDES; LATTICE MATCHING; NICKEL DISILICIDES;

METALLIC FILMS;

EID: 0030563055     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-4526(95)00910-8     Document Type: Article

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