The role of gas-phase in the laser etching of Cu by CCl 4

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 453-456

  Debarre D ^a   Aliouchouche, A ^a   Boulmer, J ^a   Bourguignon, B ^a   Budin, J P ^a  

^a UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CARBON TETRACHLORIDE; CHEMICAL REACTIONS; COPPER; GASES; LASER APPLICATIONS; LASER PULSES; LASERS; MOLECULES; MONOLAYERS; SUBSTRATES; SURFACES;

GAS MOLECULES; GAS SURFACE CHEMICAL REACTION; LASER ETCHING; LASER GAS INTERACTION; REACTIVE ATOMS;

ETCHING;

EID: 0030563024     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00457-2     Document Type: Article

References (9)

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2. J. Boulmer, B. Bourguignon, J.P. Budin and D. Débarre, Appl. Surf. Sci. 43 (1989) 424.
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8. A. Aliouchouche, Thèse, Université Paris XI, Orsay (1995).
9. A. Aliouchouche, J. Boulmer, B. Bourguignon, J.P. Budin, D. Débarre and A. Desmur, Appl. Surf. Sci. 69 (1993) 52.