VUV ablation of polymers by emission from gas-puff Z-pinch plasmas

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 563-568

  Deno, H ^a   Sugiyama, S ^a   Kakudate, Y ^b   Yoshida, M ^b   Fujiwara, S ^b  

^a FUJI ELECTRIC CO   (Japan)

^b NATL INST OF MAT AND CHEM RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MASKS; POLYTETRAFLUOROETHYLENES; POLYVINYL CHLORIDES; SURFACES; ULTRAVIOLET RADIATION;

GAS PUFF Z PINCH PLASMAS; POLYMER ABLATION;

PLASMA APPLICATIONS;

EID: 0030562976     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00531-5     Document Type: Article

References (5)

1. F. Kannari et al., Rev. Laser Eng. 19 (1991) 986 (in Japanese).
2. Y. Kakudate et al., Nat. Conv. IEE Jpn. 136 (1992) (in Japanese).
3. J. Samson, Techniques of Vacuum Ultraviolet Spectroscopy (Wiley, New York, 1967).
4. H. Deno et al., Jpn. Soc. Appl. Phys. Rel. Soc. 29a-S-1 (1995) (in Japanese).
5. Y. Kakudate et al., China-Japan International Workshop on Plasma Technologies and Applications, Hsinchu, Taiwan, EP-93-2 (1993).