Characterization of interface roughness in W/Si multilayers by high resolution diffuse X-ray scattering

Physica B: Condensed Matter

Volumn 221, Issue 1-4, 1996, Pages 13-17

  Salditt, T ^a   Lott, D ^a   Metzger, T H ^a   Peisl, J ^a   Vignaud, G ^b   Legrand, J F ^b   Grubel G ^b   Hoghoi P ^c   Scharpf O ^c  

^a UNIVERSITY OF MUNICH   (Germany)

^b EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^c INSTITUT LAUE LANGEVIN   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ELECTROMAGNETIC WAVE SCATTERING; INTERFACES (MATERIALS); SILICON; SURFACE ROUGHNESS; TUNGSTEN; X RAY ANALYSIS;

HIGH RESOLUTION DIFFUSE X RAY SCATTERING; INTERFACE ROUGHNESS;

METALLIC SUPERLATTICES;

EID: 0030562958     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-4526(95)00899-3     Document Type: Article

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