Laser-solid interaction and dynamics of laser-ablated materials

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 45-49

  Chen, K R ^a,b   Leboeuf, J N ^a   Wood, R F ^a   Geohegan, D B ^a   Donato, J M ^a   Liu, C L ^a   Puretzky, A A ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b NATIONAL CHANGHUA UNIVERSITY OF EDUCATION   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; DYNAMICS; HYDRODYNAMICS; IONIZATION; LIGHT PROPAGATION; MATHEMATICAL MODELS; PRESSURE; THERMAL DIFFUSION; THERMAL EXPANSION; THIN FILMS; VAPORIZATION;

ABLATED PLUME; ANNEALING MODEL; LASER ABLATED MATERIALS; LASER SOLID INTERACTION; PLUME PROPAGATION; PULSED LASER DEPOSITION; THERMAL VAPORIZATION TEMPERATURE;

LASER ABLATION;

EID: 0030562936     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00463-7     Document Type: Article

References (11)

1. R.F. Wood and G.A. Geist, Phys. Rev. Lett. 57 (1986) 873.
2. G.E. Jellison, Jr., D.H. Lowndes, D.N. Mashburn and R.F. Wood, Phys. Rev. B 34 (1986) 2407.
3. D.H. Lowndes et al., Appl. Phys. Lett. 41 (1982) 938.
4. D.B. Chrisey and G.K. Hubler, Pulsed Laser Deposition of Thin Films (Wiley, New York, 1994).
5. L.D. Landau and E.M. Lifshitz, Fluid Mechanics (Addison-Wesley, New York, 1959) p. 357.
6. R. Kelly, J. Chem. Phys. 92 (1990) 5047, and references therein.
7. R. Kelly, A. Miotello, A. Mele, A. Giardini, J.W. Hastie, P.K. Schenck and H. Okabe, Surf. Sci., submitted. Also, private communication with R. Kelly.
8. See, for example, A. Vertes, in: 2nd Int. Conf. on Laser Ablation: Mechanisms and Application - II, Eds. J.C. Miller and D.B. Geohegan, AIP Conf. Proc. Vol. 288 (1994) 275.
9. G. Weyl, A. Pirri and R. Root, AIAA J. 19 (1981) 460.
10. G.A. Sod, J. Comput. Phys. 27 (1978) 131.
11. W.H. Press, B.P. Flannery, S.A. Teukolsky and W.T. Vetterling, Numerical Recipes (FORTRAN Version) (1989) 267.