Scale-up of pulsed laser deposition (PLD) for 4″-wafer coating

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 643-648

  Panzner, M ^a   Dietsch, R ^a   Holz, Th ^a   Mai, H ^a   Vollmar S ^a  

^a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; COATING TECHNIQUES; COMPUTER SIMULATION; EFFICIENCY; ELLIPSOMETRY; LASER BEAM EFFECTS; LASER PRODUCED PLASMAS; MOTION CONTROL; PROCESS CONTROL; PULSED LASER APPLICATIONS; SPECIMEN PREPARATION; THIN FILMS;

FILM THICKNESS GRADIENTS; PLASMA PLUMES; PULSED LASER DEPOSITION; THICKNESS HOMOGENEITY; UNIFORM TARGET EROSION; WAFER COATING;

DEPOSITION;

EID: 0030562909     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00536-6     Document Type: Article

References (8)

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