Ultrathin film deposition by pulsed laser ablation using crossed beams

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 649-655

  Gorbunov, A A ^a   Pompe, W ^a   Sewing, A ^a   Gaponov, S V ^b   Akhsakhalyan, A D ^b   Zabrodin, I G ^b   Kas'kov, I A ^b   Klyenkov, E B ^b   Morozov, A P ^b   Salaschenko, N N ^b   Dietsch, R ^c   Mai, H ^c   Vollmar S ^c  

^a Max Planck Arbeitsgruppe 'Mech H   (Germany)

^b INSTITUTE FOR PHYSICS OF MICROSTRUCTURES   (Russian Federation)

^c FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER CONTROL SYSTEMS; LASER ABLATION; MULTILAYERS; PROCESS CONTROL; PULSED LASER APPLICATIONS; SOLUTIONS; ULTRATHIN FILMS;

ABLATION PLUMES; HIGH ENERGY PLASMA PARTICLES; PULSED LASER ABLATION; SOLID STATE SOLUTIONS; ULTRATHIN FILM DEPOSITION;

DEPOSITION;

EID: 0030562894     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00537-4     Document Type: Article

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